Affiliation:
1. State Key Lab of Superhard Materials, College of Physics, Jilin University, Changchun 130012, People's Republic of China
Abstract
Deep-ultraviolet (DUV) photodetectors based on hexagonal boron nitride ( h-BN) have demonstrated great potentials for various commercial and military applications; however, to date, most studies show that the h-BN photodetectors suffer from poor performance, such as low responsivity and large dark current. Herein, we report the dramatic enhancement of photoresponse in the DUV region of a h-BN device coupled with plasmonic nanostructures of either h-BN nanosheets (BNNSs) or Au nanoparticles (NPs). Large-area h-BN thin films that have been directly grown on quartz substrates using the ion beam assistant deposition method exhibit a uniform thickness of ∼200 nm, an ultrawide bandgap (∼ 6 eV), and an excellent light transparency in the visible region. Based on the vertical charge transfer integrated with plasmonic nanoarrays, the photocurrent of the h-BN device can be greatly enhanced by up to about 7–9 times under the illumination of 205 nm by showing a cutoff wavelength at ∼220 nm. Owing to the retained low dark current and large photo-gain induced by localized plasmonic resonances, this hybrid photodetector exhibits 32- and 57-fold improvement in responsivity at a 205 nm wavelength by BNNSs and Au NPs, respectively. This work demonstrates plasmonic enhancement on optoelectronic properties of h-BN based on not only metallic but also semiconducting nanostructures and provides alternative pathways for the development of low-cost, large-area, high-performance, DUV photodetectors for various optoelectronic devices and security applications.
Funder
National Natural Science Foundation of China
Foundation of Jilin Educational Committee
Foundation of Jilin Development and Reform Commission
Subject
Physics and Astronomy (miscellaneous)
Cited by
6 articles.
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