Low dislocation density GaAs on Si heteroepitaxy with atomic hydrogen irradiation for optoelectronic integration

Author:

Okada Yoshitaka,Shimomura Hirofumi,Kawabe Mitsuo

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 42 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Low-temperature direct growth for low dislocation density in III-V on Si towards high-efficiency III-V/Si tandem solar cells;Japanese Journal of Applied Physics;2021-02-26

2. Inorganic photovoltaics – Planar and nanostructured devices;Progress in Materials Science;2016-09

3. Potential and Activities of III-V/Si Tandem Solar Cells;ECS Journal of Solid State Science and Technology;2015-12-15

4. Optical property improvement of InAs/GaAs quantum dots grown by hydrogen-plasma-assisted molecular beam epitaxy;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-05

5. Reduction of carrier concentrations of β-FeSi2 films by atomic hydrogen-assisted molecular beam epitaxy;Physics Procedia;2011

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