Process‐induced mechanical stress in isolation structures studied by micro‐Raman spectroscopy
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.354365
Reference13 articles.
1. Micro‐Raman study of stress distribution in local isolation structures and correlation with transmission electron microscopy
2. LOPOS: Advanced Device Isolation for a 0.8 μm CMOS/BULK Process Technology
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