Multiscale modeling of plasma–surface interaction—General picture and a case study of Si and SiO2 etching by fluorocarbon-based plasmas
Author:
Affiliation:
1. PLASMANT, Department of Chemistry, University of Antwerp, Universiteitsplein 1, 2610 Wilrijk-Antwerp, Belgium
2. ASML Research, De Run 6501, Veldhoven, North Brabant, 5504DR, Netherlands
Funder
ASML
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
https://aip.scitation.org/doi/pdf/10.1063/5.0058904
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