Factors affecting the properties of highly conductive flexible ultrathin ITO films in confined large area magnetron sputtering in three dimensions-Reference-Cited by-同舟云学术

Factors affecting the properties of highly conductive flexible ultrathin ITO films in confined large area magnetron sputtering in three dimensions

Published:2018-10 Issue:10 Volume:8 Page:105112
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Sahu Bibhuti Bhusan¹^ORCID,Wen Long¹,Kwon Ji Hye²,Han Jeon Geon¹

Affiliation:

1. School of Advanced Materials Science and Engineering, Center for Advanced Plasma Surface Technology (CAPST), Sungkyunkwan University, Suwon 440-746, South Korea

2. Department of Materials Science & Engineering, Seoul National University, Seoul 151-744, South Korea

Funder

MSIT

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

https://aip.scitation.org/doi/pdf/10.1063/1.5053570

Reference55 articles.

1. Structure and characteristics of ultrathin indium tin oxide films

2. Indium‐tin oxide thin films prepared by chemical vapor deposition

3. Development and utility of a new 3-D magnetron source for high rate deposition of highly conductive ITO thin films near room temperature

4. Highly Conducting, Transparent, and Flexible Indium Oxide Thin Film Prepared by Atomic Layer Deposition Using a New Liquid Precursor Et2InN(SiMe3)2

5. The influence of film structure on In2O3 gas response

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