Unimolecular dissociation dynamics of disilane
Author:
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.458169
Reference32 articles.
1. Mechanistic Studies of Chemical Vapor Deposition
2. A Mathematical Model of Silicon Chemical Vapor Deposition: Further Refinements and the Effects of Thermal Diffusion
3. Computational studies of heterogeneous reactions of SiH2 on reconstructed Si(111)–(7×7) and Si(111)–(1×1) surfaces
4. Computational studies of heterogeneous reactions of SiH2 on reconstructed Si(111)–(7×7) and Si(111)–(1×1) surfaces
5. Computational studies of SiH2+SiH2 recombination reaction dynamics on a global potential surface fitted to ab initio and experimental data
Cited by 52 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Modelling the non-local thermodynamic equilibrium spectra of silylene (SiH2);Physical Chemistry Chemical Physics;2021
2. Initial growth kinetics of positive and negative hydrogenated Si cluster ions under the presence of silane radicals;Japanese Journal of Applied Physics;2019-03-19
3. A Self-Starting Method for Obtaining Analytic Potential-Energy Surfaces from ab Initio Electronic Structure Calculations;The Journal of Physical Chemistry A;2009-01-05
4. Reactions of disilane with the deuterium-terminated Ge(100) 2×1 surface;Surface Science;2008-06
5. Energetics and Rate Constants of Si2H6 and Ge2H6 Dissociative Adsorption on Dimers of SiGe(100)-2 × 1;The Journal of Physical Chemistry C;2007-08-22
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3