Tuning of noble metal work function with organophosphonate nanolayers
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4890486
Reference43 articles.
1. High-κ gate dielectrics: Current status and materials properties considerations
2. High dielectric constant gate oxides for metal oxide Si transistors
3. Charge Conduction and Breakdown Mechanisms in Self-Assembled Nanodielectrics
4. Low-voltage organic transistors with an amorphous molecular gate dielectric
5. Impact of gate workfunction on device performance at the 50 nm technology node
Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Nanomolecularly-induced Effects at Titania/Organo-Diphosphonate Interfaces for Stable Hybrid Multilayers with Emergent Properties;ACS Applied Nano Materials;2024-05-03
2. Engineering inorganic interfaces using molecular nanolayers;Applied Physics Letters;2023-06-26
3. Selective Pd recovery from acidic leachates by 3-mercaptopropylphosphonic acid grafted TiO2: does surface coverage correlate to performance?;RSC Advances;2022
4. Spray coating vs. immersion for self-assembly of gemini perfluorinated phosphonic acids on indium tin oxide;Thin Solid Films;2021-08
5. Frequency-tunable toughening in a polymer-metal-ceramic stack using an interfacial molecular nanolayer;Nature Communications;2018-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3