Self-organization and self-limitation in high power impulse magnetron sputtering-Reference-Cited by-同舟云学术

Self-organization and self-limitation in high power impulse magnetron sputtering

Published:2012-05-28 Issue:22 Volume:100 Page:224104
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Anders André

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4724205

Reference18 articles.

1. A novel pulsed magnetron sputter technique utilizing very high target power densities

2. A. Ehiasarian,in Plasma Surface Engineering Research and Its Practical Applications, edited by R. Wei (Research Signpost, Kerala, India, 2008), p. 35.

3. High power impulse magnetron sputtering discharge

4. Design advances and applications of the rotatable cylindrical magnetron

5. Noble gas retention in the target during rotating cylindrical magnetron sputtering

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