Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma-Reference-Cited by-同舟云学术

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Atomic layer deposition of aluminum fluoride using Al(CH3)3 and SF6 plasma

Published:2017-09-11 Issue:11 Volume:111 Page:113105
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Vos M. F. J.¹,Knoops H. C. M.¹²^ORCID,Synowicki R. A.³,Kessels W. M. M.¹,Mackus A. J. M.¹^ORCID

Affiliation:

1. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

2. Oxford Instruments Plasma Technology, North End, Bristol BS49 4AP, United Kingdom

3. J.A. Woollam Co., Inc., 645 M Street, Suite 102, Lincoln, Nebraska 68508, USA

Funder

Nederlandse Organisatie voor Wetenschappelijk Onderzoek (NWO)

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4998577

Reference38 articles.

1. Optical transitions in disordered thin films of the ionic compounds MgF_2 and AlF_3 as a function of their conditions of preparation

2. Effects of substrate temperatures and deposition rates on properties of aluminum fluoride thin films in deep-ultraviolet region

3. Process for deposition of AlF_3 thin films

4. Optical and durability properties of infrared transmitting thin films

5. Low Propagation Loss of Single-Mode Planar Waveguides on MgF$_{\bf 2}$ Crystals

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1. Hydrothermal crystal growth of tetralithium octafluoridozirconate (Li4ZrF8) and its physicochemical properties;Journal of Alloys and Compounds;2023-12

2. Isotropic atomic layer etching of GaN using SF6 plasma and Al(CH3)3;Journal of Applied Physics;2023-08-17

3. Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching;Nanomaterials;2022-10-06

4. Effects of Atmospheric Fluorine-Containing Nonthermal Plasmas on Demineralization and Remineralization of Tooth Enamel;IEEE Transactions on Plasma Science;2022-09

5. Comparison of AlF3 thin films grown by thermal and plasma enhanced atomic layer deposition;Journal of Vacuum Science & Technology A;2022-01

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