Charge conduction mechanisms of atomic-layer-deposited Er2O3 thin films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3159833
Reference9 articles.
1. Er2O3 as a high-K dielectric candidate
2. Interfacial reactions between thin rare-earth-metal oxide films and Si substrates
3. Fowler-Nordheim hole tunneling in metal-Er2O3-silicon structures
4. Superior electrical properties of crystalline Er2O3 films epitaxially grown on Si substrates
5. Temperature dependence of the current conduction mechanisms in LaAlO3 thin films
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