A microwave-induced plasma source: Characterization and application for the fast deposition of crystalline silicon films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2833339
Reference30 articles.
1. The atmospheric-pressure plasma jet: a review and comparison to other plasma sources
2. Radio-frequency microdischarge arrays for large-area cold atmospheric plasma generation
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4. Atmospheric pressure plasma chemical vapor deposition system for high-rate deposition of functional materials
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