Ultrahigh-speed etching of organic films using microwave-excited nonequilibrium atmospheric-pressure plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2030409
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1. Appearance of stable glow discharge in air, argon, oxygen and nitrogen at atmospheric pressure using a 50 Hz source
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3. Production of CW High-Density Non-Equilibrium Plasma in the Atmosphere Using Microgap Discharge Excited by Microwave
4. Ultrahigh-speed etching of SiO2 with ultrahigh selectivity over Si in microwave-excited non equilibrium atmospheric pressure plasma
5. Etching process of silicon dioxide with nonequilibrium atmospheric pressure plasma
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