Etching process of silicon dioxide with nonequilibrium atmospheric pressure plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1944219
Reference9 articles.
1. Mechanisms of the HF/H2O vapor phase etching of SiO2
2. Dissolution Kinetics of Crystalline and Amorphous Silica in Hydrofluoric-Hydrochloric Acid Mixtures
3. Appearance of stable glow discharge in air, argon, oxygen and nitrogen at atmospheric pressure using a 50 Hz source
4. High-pressure hollow cathode discharges
5. Production of CW High-Density Non-Equilibrium Plasma in the Atmosphere Using Microgap Discharge Excited by Microwave
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