Atomic-layer deposition of ZrO2 with a Si nitride barrier layer
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1510584
Reference19 articles.
1. Effects of deposition conditions on step-coverage quality in low-pressure chemical vapor deposition of HfO2
2. Low-pressure chemical vapor deposition of TaCN films by pyrolysis of ethylamido-tantalum
3. Characterization of high-K dielectric ZrO[sub 2] films annealed by rapid thermal processing
4. Thermodynamic stability of binary oxides in contact with silicon
5. The chemical vapour deposition and characterization of ZrO2 films from organometallic compounds
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