Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam-Reference-Cited by-同舟云学术

Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam

Published:2016-08 Issue:8 Volume:6 Page:085210
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Oyama Tomoko Gowa¹,Oshima Akihiro²³,Tagawa Seiichi²³

Affiliation:

1. Quantum Beam Science Research Directorate, National Institutes for Quantum and Radiological Science and Technology, 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan

2. Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan

3. The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan

Funder

Japan Society for the Promotion of Science (JSPS)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4961378

Reference26 articles.

1. Resist blur and line edge roughness

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