Study of hydrogen ECR plasma in a simple mirror magnetic trap heated by 75 GHz pulsed gyrotron radiation
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4978278
Reference30 articles.
1. Source for extreme ultraviolet lithography based on plasma sustained by millimeter-wave gyrotron radiation
2. Reactive nitrogen source based on ECR discharge sustained by 24 GHz radiation
3. Deposition of microcrystalline silicon in electron-cyclotron resonance discharge (24GHz) plasma from silicon tetrafluoride precursor
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