Author:
Chkhalo Nikolay I.,Golubev Sergei V.,Mansfeld Dmitry,Salashchenko Nikolay N.,Sjmaenok Leonid A.,Vodopyanov Alexander V.
Publisher
SPIE-Intl Soc Optical Eng
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference24 articles.
1. Bakshi, V. ,EUV Sources for Lithography, SPIE Press, Bellingham, Washington, USA (2006).
2. Lithography, Michael Wang (Ed.), Intech, 32000 Vukovar, Croatia, ISBN: 978-953-307-064-3 (2010).
3. Laser-produced plasma source development for EUV lithography
4. High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography
5. Soft X-rays generated by the electron-cyclotron resonance discharge in heavy gases sustained by a high-power microwave beam in a magnetic trap
Cited by
26 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献