Detachment-induced electron production in the early afterglow of pulsed cc-rf oxygen plasmas
Author:
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4737196
Reference34 articles.
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1. Probing negative ions and electrons in the afterglow of a low-pressure oxygen radiofrequency plasma using laser-induced photodetachment;Journal of Physics D: Applied Physics;2021-09-13
2. Axial diagnosis of radio-frequency capacitively coupled Ar/O2 plasma;Acta Physica Sinica;2021
3. Temporal evolution of plasma parameters in a pulse-modulated capacitively coupled Ar/O2 mixture discharge;AIP Advances;2020-11-01
4. Axial diagnosis of electron and negative ion behaviors in capacitively coupled O2-containing Ar plasma driven by 27.12 MHz;Physics of Plasmas;2019-03
5. PIC simulations of capacitively coupled oxygen rf discharges;The European Physical Journal D;2018-05
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