Temporal evolution of plasma parameters in a pulse-modulated capacitively coupled Ar/O2 mixture discharge
Author:
Affiliation:
1. Plasma Physics Laboratory, Department of Physics, COMSATS University, Islamabad 45550, Pakistan
Funder
Higher Education Commission, Pakistan
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/5.0019527
Reference40 articles.
1. Principles of Plasma Discharges and Materials Processing
2. Stochastic heating in single and dual frequency capacitive discharges
3. Spatial distribution of nonemissive metastables in a two-frequency capacitively coupled plasma in Ar by using a pair of optical emission lines
4. Measurement of electron temperatures and electron energy distribution functions in dual frequency capacitively coupled CF4/O2 plasmas using trace rare gases optical emission spectroscopy
5. Pulsed plasma etching for semiconductor manufacturing
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2. Numerical study on dust particle charging and dynamics in continuous and pulsed radio frequency argon discharges;Contributions to Plasma Physics;2024-02-25
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