Determination of the absolute CH3 radical flux emanating from a methane electron cyclotron resonance plasma
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.121713
Reference21 articles.
1. Plasma Deposition, Properties and Structure of Amorphous Hydrogenated Carbon Films
2. Properties of diamond-like carbon
3. A combined plasma‐surface model for the deposition of C:H films from a methane plasma
4. Mechanisms of the Deposition of Hydrogenated Carbon Films
5. Surface relaxation during plasma-enhanced chemical vapor deposition of hydrocarbon films, investigated byin situellipsometry
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