A combined plasma‐surface model for the deposition of C:H films from a methane plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.356603
Reference19 articles.
1. Diamond and diamondlike films: Deposition processes and properties
2. Electron and chemical kinetics in methane rf glow‐discharge deposition plasmas
3. Diagnostics and modelling of a methane plasma used in the chemical vapour deposition of amorphous carbon films
4. Detailed surface and gas-phase chemical kinetics of diamond deposition
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