A view of the implanted SiC damage by Rutherford backscattering spectroscopy, spectroscopic ellipsometry, and transmission electron microscopy
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2360150
Reference13 articles.
1. 6H-silicon carbide devices and applications
2. High-Sensitivity Ion Beam Analytical Method for Studying Ion-Implanted SiC
3. Effect of ion current density on damage in Al ion implanted SiC
4. Ion implantation of silicon carbide
5. Ion implantation-caused damage in SiC measured by spectroscopic ellipsometry
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Electrical properties of n-type 3C-SiC epilayers in situ doped with extremely high levels of phosphorus;Semiconductor Science and Technology;2018-10-12
2. Annealing Effect on the Structural and Magnetic Properties of Mn-Implanted 6H-SiC;IEEE Transactions on Magnetics;2014-11
3. Electrical and structural properties of polycrystalline 3C-SiC layer regrown from amorphized 4H-SiC(0001) by P and Al ion implantations;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2012-02
4. Structure and characteristics of the high-temperature SiC detectors based on Al ion-implanted p+–n junctions;Semiconductor Science and Technology;2011-02-16
5. Annealing effects on structural, optical and electrical properties of Al implanted 4H-SiC;2009 IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC);2009-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3