Mechanisms of copper chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.107370
Reference10 articles.
1. Low-temperature metal-organic chemical vapor deposition (LTMOCVD) of device-quality copper films for microelectronic applications
2. Chemical vapor deposition of copper from 1,5‐cyclooctadiene copper(I) hexafluoroacetylacetonate
3. Integrated thermal chemical vapor deposition processing for Si technology
4. Alkene and carbon monoxide derivatives of copper(I) and silver(I) .beta.-diketonates
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