Selection Criteria for Small-Molecule Inhibitors in Area-Selective Atomic Layer Deposition: Fundamental Surface Chemistry Considerations
Author:
Affiliation:
1. TNO-Holst Centre, High Tech Campus 31, 5656 AE Eindhoven, The Netherlands
2. Department of Chemistry and Biochemistry, University of Delaware, Newark, Delaware 19716, United States
Funder
Division of Civil, Mechanical and Manufacturing Innovation
Publisher
American Chemical Society (ACS)
Subject
General Medicine,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.accounts.3c00221
Reference61 articles.
1. In situ investigation of organic ligand displacement processes on ZnO powder surface
2. Computational Investigation of Electronic and Steric Effects in Surface Reactions of Metalorganic Precursors on Functionalized Silicon Surfaces
3. Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle
4. Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors
5. Area-Selective Deposition: Fundamentals, Applications, and Future Outlook
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