Mechanisms of silicon oxidation at low temperatures by microwave‐excited O2gas and O2‐N2mixed gas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.345465
Reference7 articles.
1. Silicon Oxidation in an Oxygen Plasma Excited by Microwaves
2. Silicon Oxide Films Grown in a Microwave Discharge
3. Plasma anodization as a dry low temperature technique for oxide film growth on silicon substrates
4. Thin silicon oxides grown by low‐temperature rf plasma anodization and deposition
5. Low Temperature Oxidation of Silicon in a Microwave‐Discharged Oxygen Plasma
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