Etching in a pulsed plasma
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.339362
Reference8 articles.
1. Pulsed high rate plasma etching with variable Si/SiO2selectivity and variable Si etch profiles
2. Some features of RF excited fully ionized low pressure argon plasma
3. The reaction of fluorine atoms with silicon
4. DC plasma etching of silicon by sulfur hexafluoride. Mass spectrometric study of the discharge products
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