Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
Author:
Affiliation:
1. Department of Materials Science and Engineering, Yonsei University, 50, Yonsei-ro Seodaemungu, Seoul 03722, Republic of Korea
2. BIO-IT Micro Fab Center, Yonsei University, 50, Yonsei-ro Seodaemungu, Seoul 03722, Republic of Korea
Funder
ASM Genitech Korea Ltd.
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5085801
Reference26 articles.
1. Compositional Analysis and Capacitance‐Voltage Properties of TiO2 Films by Low Pressure Metal‐Organic Chemical Vapor Deposition
2. Tailoring the Pore Size and Architecture of CeO2/TiO2Core/Shell Inverse Opals by Atomic Layer Deposition
3. Enhancing Raman Scattering without Plasmons: Unprecedented Sensitivity Achieved by TiO2 Shell-Based Resonators
4. Growth and Crystallization of TiO2 Thin Films by Atomic Layer Deposition Using a Novel Amido Guanidinate Titanium Source and Tetrakis-dimethylamido-titanium
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1. Fabrication of Aluminum Oxide Thin-Film Devices Based on Atomic Layer Deposition and Pulsed Discrete Feed Method;Micromachines;2023-01-21
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4. Atomic layer deposition of titanium oxide thin films using a titanium precursor with a linked amido-cyclopentadienyl ligand;Journal of Materials Chemistry C;2022
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