Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water)-Reference-Cited by-同舟云学术

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Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water)

Published:2021-03 Issue: Volume:857 Page:157931
ISSN:0925-8388
Container-title:Journal of Alloys and Compounds
language:en
Short-container-title:Journal of Alloys and Compounds

Author:

Kim Byunguk,Lee Namgue,Park Suhyeon,Park Taehun,Song Jaiwon,Han Seungwook,Park Hyunwoo,Lee Dahyun,Kim Hohoon,Jeon Hyeongtag

Funder

Mecaro’s University R&D program

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Mechanical Engineering,Mechanics of Materials

Reference39 articles.

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2. Low-leakage-current DRAM-like memory using a one-transistor ferroelectric MOSFET with a Hf-based gate dielectric;Cheng;IEEE Electron. Device Lett.,2013

3. Effect of heat budget after capacitor formation on the leakage current characteristics of ZrO2-based high-k dielectrics for next-generation dynamic random-access memory capacitor;Lee;J. Nanosci. Nanotechnol.,2020

4. A mass-production compatible capacitor Technology for DRAMs with design rule down to 20nm;Choi;ECS Transactions,2009

5. Evaluating the top electrode material for achieving an equivalent oxide thickness smaller than 0.4 nm from an Al-doped TiO2 film;Jeon;ACS Appl. Mater. Interfaces,2014

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1. Stability of dielectric properties of aluminum under gamma-quantum irradiation;Technobius Physics;2023-08-25

2. Improvement of Voltage Linearity and Leakage Current of MIM Capacitors With Atomic Layer Deposited Ti-Doped ZrO₂ Insulators;IEEE Transactions on Electron Devices;2023-06

3. Atomic Layer Deposition of HfO2 Films Using TDMAH and Water or Ammonia Water;Materials;2023-05-30

4. Corrigendum to “Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water)” [J. Alloy. Compd. 857 (2021) 157931];Journal of Alloys and Compounds;2023-01

5. Au nanoparticle sensitized blue TiO₂ nanorod arrays for efficient Gatifloxacin photodegradation;RSC Advances;2023

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