Reactive ion etching of monocrystalline, polycrystalline, and amorphous silicon carbide in CF4/O2mixtures
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.104420
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1. High-Temperature Electronic Requirements in Aeropropulsion Systems
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