Characterization of extreme ultraviolet emission using the fourth harmonic of a Nd:YAG laser-Reference-Cited by-同舟云学术

Characterization of extreme ultraviolet emission using the fourth harmonic of a Nd:YAG laser

Published:2005-05-02 Issue:18 Volume:86 Page:181107
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Yamaura Michiteru,Uchida Shigeaki,Sunahara Atsushi,Shimada Yoshinori,Nishimura Hiroaki,Fujioka Shinsuke,Okuno Tomoharu,Hashimoto Kazuhisa,Nagai Keiji,Norimatsu Takayoshi,Nishihara Katsunobu,Miyanga Noriaki,Izawa Yasukazu,Yamanaka Chiyoe

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1915507

Reference22 articles.

1. X-ray production ~13 nm from laser-produced plasmas for projection x-ray lithography applications

2. New laser plasma source for extreme-ultraviolet lithography

3. Mass-limited, debris-free laser-plasma EUV source

4. X-ray generation in cryogenic targets irradiated by 1 μm pulse laser

5. Conversion efficiencies from laser‐produced plasmas in the extreme ultraviolet regime

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