New laser plasma source for extreme-ultraviolet lithography
Author:
Publisher
The Optical Society
Reference11 articles.
1. Laser-produced plasmas for soft x-ray projection lithography
2. X-ray production ~13 nm from laser-produced plasmas for projection x-ray lithography applications
3. X-ray microscopy
4. Soft x-ray projection lithography using an x-ray reduction camera
5. Prototype high-speed tape target transport for a laser plasma soft-x-ray projection lithography source
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