Highly carbon‐dopedp‐type Ga0.5In0.5As and Ga0.5In0.5P by carbon tetrachloride in gas‐source molecular beam epitaxy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.105835
Reference20 articles.
1. GaAs growth in metal–organic MBE
2. Metallic p-type GaAs and GaAlAs grown by metalorganic molecular beam epitaxy
3. Ultrahigh doping of GaAs by carbon during metalorganic molecular beam epitaxy
4. Lattice contraction due to carbon doping of GaAs grown by metalorganic molecular beam epitaxy
5. p‐type doping limit of carbon in organometallic vapor phase epitaxial growth of GaAs using carbon tetrachloride
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