Optical and structural microanalysis of GaN grown on SiN submonolayers
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2150589
Reference37 articles.
1. Metalorganic Chemical Vapor Phase Epitaxy of Crack-Free GaN on Si (111) Exceeding 1 µm in Thickness
2. The origin of stress reduction by low-temperature AlN interlayers
3. In situ monitoring of the stress evolution in growing group-III-nitride layers
4. Self-organized domain formation in low-dislocation-density GaN
5. Selective growth of wurtzite GaN and AlxGa1−xN on GaN/sapphire substrates by metalorganic vapor phase epitaxy
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1. Effects of growth temperature for in-situ deposited SiNx interlayer on structural and optical properties of semipolar (112¯2) AlGaN films;Applied Surface Science;2023-01
2. Improving Transport Properties of GaN-Based HEMT on Si (111) by Controlling SiH4 Flow Rate of the SiNx Nano-Mask;Coatings;2020-12-25
3. GaN Heteroepitaxy on Strain-Engineered (111) Si/Si1−xGex;Journal of Electronic Materials;2019-02-21
4. Proposition of a model elucidating the AlN-on-Si (111) microstructure;Journal of Applied Physics;2018-06-07
5. Influence of in-situ deposited SiNx interlayer on crystal quality of GaN epitaxial films;Superlattices and Microstructures;2018-05
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