Composition and growth kinetics of ultrathin SiO2films formed by oxidizing Si substrates in N2O
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.104199
Reference16 articles.
1. Kinetics of Thermal Growth of Ultra-Thin Layers of SiO[sub 2] on Silicon
2. The Growth and Characterization of Very Thin Silicon Dioxide Films
3. Rapid thermal processing of thin gate dielectrics. Oxidation of silicon
4. CHARGE STORAGE MODEL FOR VARIABLE THRESHOLD FET MEMORY ELEMENT
5. Formation of 20–25Å Thermal Oxide Films on Silicon at 950°–1140°C
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