Evaluation of resist sensitivity in extreme ultraviolet/soft x-ray region for next-generation lithography-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Evaluation of resist sensitivity in extreme ultraviolet/soft x-ray region for next-generation lithography

Published:2011-12 Issue:4 Volume:1 Page:042153
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Oyama Tomoko Gowa,Oshima Akihiro,Washio Masakazu,Tagawa Seiichi

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.3665672

Reference11 articles.

1. Reflective multilayer optics for 6.7 nm wavelength radiation sources and next generation lithography

2. V. Banine, A. Yakunin, and D. Glushkov, Proc. 2010 International Workshop on Extreme Ultraviolet Sources, p. 14 (2010).

3. ZEON Co., ZEP520 Technical Report, Ver.1.01 (2003).

4. ZEON Co., ZEP7000 Technical Report, Ver.1.07 (2003).

Cited by 19 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Enhancement of 6.7 nm EUV emission from laser-produced Gd plasma with micro-structured target;Vacuum;2024-04

2. Effect of Time Delay on Laser-Triggered Discharge Plasma for a Beyond EUV Source;Symmetry;2019-05-11

3. Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam;AIP Advances;2016-08

4. Eco-friendly photolithography using water-developable pure silk fibroin;RSC Adv.;2016

5. Highly efficient and controllable method to fabricate ultrafine metallic nanostructures;AIP Advances;2015-11

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP