A laboratory X-ray microscopy study of cracks in on-chip interconnect stacks of integrated circuits

Author:

Kutukova K.1ORCID,Niese S.1ORCID,Sander C.1,Standke Y.1,Gluch J.1ORCID,Gall M.1,Zschech E.1

Affiliation:

1. Fraunhofer Institute for Ceramic Technologies and Systems, Maria-Reiche-Strasse 2, 01109 Dresden, Germany

Funder

Semiconductor Research Corporation

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Reference17 articles.

1. D. Ingerly , S. Agraharam , D. Becher , V. Chikarmane , K. Fischer , R. Grover , M. Goodner , S. Haight , J. He , T. Ibrahim et al., in Proceedings of International Interconnect Technology Conference (IITC), Burlingame, CA, USA (2008), pp. 216–218.

2. D. Ingerly , A. Agrawal , R. Ascazubi , A. Blattner , M. Buehler , V. Chikarmane , B. Choudhury , F. Cinnor , C. Ege , C. Ganpule et al., in Proceedings of the International Interconnect Technology Conference (IITC), San Jose, CA, USA (2012), pp. 1–3.

3. Controlled Fracture and Mode-Mixity Dependence of Nanoscale Interconnects

4. Progress in the development and understanding of advanced low k and ultralow k dielectrics for very large-scale integrated interconnects—State of the art

5. Chip-packaging interaction: a critical concern for Cu/low k packaging

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