Formation, nature, and stability of the arsenic-silicon-oxygen alloy for plasma doping of non-planar silicon structures
Author:
Affiliation:
1. Tokyo Electron America, Inc., Austin, Texas 78741, USA
2. Department of Chemical Engineering, University of Texas at Austin, Austin, Texas 78712, USA
3. Tokyo Electron Ltd., Nirasaki, Yamanashi 407-0192, Japan
Funder
Welch Foundation
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4905206
Reference35 articles.
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4. Production-Worthy USJ Formation by Self-Regulatory Plasma Doping Method
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