Refined calculations of effective attenuation lengths for SiO2 film thicknesses by x-ray photoelectron spectroscopy
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2422903
Reference23 articles.
1. The electron attenuation length revisited
2. Electron effective attenuation lengths for applications in Auger electron spectroscopy and x-ray photoelectron spectroscopy
3. Influence of elastic-electron scattering on measurements of silicon dioxide film thicknesses by x-ray photoelectron spectroscopy
4. Comparisons of calculated and measured effective attenuation lengths for silicon dioxide over a wide electron energy range
5. Comparisons of calculated and measured effective attenuation lengths for silicon dioxide over a wide electron energy range
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3. Evaluation of Two Methods for Determining Shell Thicknesses of Core–Shell Nanoparticles by X-ray Photoelectron Spectroscopy;The Journal of Physical Chemistry C;2016-09-27
4. Reproducibility of XPS analysis for film thickness of SiO2/Si by active Shirley method;Journal of Electron Spectroscopy and Related Phenomena;2016-02
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