Perspective: Is there a hysteresis during reactive High Power Impulse Magnetron Sputtering (R-HiPIMS)?
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4976717
Reference73 articles.
1. Hysteresis-free reactive high power impulse magnetron sputtering
2. Dynamic behaviour of the reactive sputtering process
3. Modeling of reactive sputtering of compound materials
4. Fundamental understanding and modeling of reactive sputtering processes
5. Upgrading the “Berg-model” for reactive sputtering processes
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