Si–H bonding in low hydrogen content amorphous silicon films as probed by infrared spectroscopy and x-ray diffraction
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.372073
Reference35 articles.
1. a‐Si : H produced by high‐temperature thermal decomposition of silane
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4. A reduction in the Staebler-Wronski effect observed in low H content a-Si:H films deposited by the hot wire technique
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