Si surface passivation by Al2O3 thin films deposited using a low thermal budget atomic layer deposition process
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4800541
Reference26 articles.
1. Surface passivation of high-efficiency silicon solar cells by atomic-layer-deposited Al2O3
2. 19.4%-efficient large-area fully screen-printed silicon solar cells
3. High efficiency n-type Si solar cells on Al2O3-passivated boron emitters
4. Back-junction back-contact n-type silicon solar cells with screen-printed aluminum-alloyed emitter
5. Silicon surface passivation by atomic layer deposited Al2O3
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