Calculation of Deposition Profiles and Compositional Analysis of Cosputtered Films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1661378
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1. The ?multiple-sample concept? in materials research: Synthesis, compositional analysis and testing of entire multicomponent systems
2. Die Molekularströmung der Gase durch Offnungen und die Effusion
3. Momentum Transfer in Sputtering by Ion Bombardment
4. Angular Distribution of Sputtered Material
5. Re‐emission Coefficients of Si and SiO2 Films Deposited through rf and dc Sputtering
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