Re‐emission Coefficients of Si and SiO2 Films Deposited through rf and dc Sputtering
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1709199
Reference9 articles.
1. Sputtering of Dielectrics by High‐Frequency Fields
2. Dielectric Thin Films through rf Sputtering
3. The deposition of sputtered films
4. Sputtering of a polycristalline silver surface bombarded with monoenergetic argon ions of low energy (40–240 eV)
5. Properties of Insulating Thin Films Deposited by RF Sputtering
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