Ionized physical vapor deposition of Cu using a mixture of rare gases
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1345520
Reference7 articles.
1. Magnetron sputter deposition with high levels of metal ionization
2. Metal ion deposition from ionized mangetron sputtering discharge
3. Ionized physical vapor deposition of integrated circuit interconnects
4. Two-dimensional modeling of high plasma density inductively coupled sources for materials processing
5. Design issues in ionized metal physical vapor deposition of copper
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Evaluating substrate bias on the phase-forming behavior of tungsten thin films deposited by diode and ionized magnetron sputtering;Thin Solid Films;2005-07
2. Thermalization of sputtered aluminium atoms in an electron cyclotron resonance plasma source;Plasma Sources Science and Technology;2003-06-23
3. Characterization of CuCl nanocrystals in SiO[sub 2] matrix fabricated by inductively coupled plasma-assisted sputtering deposition;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2003
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