Charge build‐up in Si‐processing plasma caused by electron shading effect
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.363179
Reference11 articles.
1. Modulation-Doped Multi-Quantum Well (MD-MQW) Lasers. II. Experiment
2. A model and experiments for thin oxide damage from wafer charging in magnetron plasmas
3. Plasma‐charging damage: A physical model
4. New Phenomena of Charge Damage in Plasma Etching: Heavy Damage Only through Dense-Line Antenna
5. Charge Damage Caused by Electron Shading Effect
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