Reproducible growth of p-type ZnO:N using a modified atomic layer deposition process combined with dark annealing
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3000604
Reference18 articles.
1. Recent advances in processing of ZnO
2. Control of Doping by Impurity Chemical Potentials: Predictions forp-Type ZnO
3. Codoping for the fabrication of p-type ZnO
4. Nitrogen-induced defects in ZnO:N grown on sapphire substrate by gas source MBE
5. High performance thin film transistor with low temperature atomic layer deposition nitrogen-doped ZnO
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