Flow-Through Atmospheric Pressure-Atomic Layer Deposition Reactor for Thin-Film Deposition in Capillary Columns-Reference-Cited by-同舟云学术

Flow-Through Atmospheric Pressure-Atomic Layer Deposition Reactor for Thin-Film Deposition in Capillary Columns

Published:2022-05-17 Issue:21 Volume:94 Page:7483-7491
ISSN:0003-2700
Container-title:Analytical Chemistry
language:en
Short-container-title:Anal. Chem.

Author:

Patel Dhananjay I.¹,Major George H.¹,Jacobsen Collin¹,Shah Dhruv¹,Strohmeier Brian R.²,Shollenberger Daniel³,Bell David S.³,Argyle Morris D.⁴^ORCID,Linford Matthew R.¹^ORCID

Affiliation:

1. Department of Chemistry & Biochemistry, Brigham Young University, Provo, Utah 84602, United States

2. Label and Graphic Materials, Avery Dennison Corporation, North America, 8080 Norton Parkway, Mentor, Ohio 44060, United States

3. Restek Corporation, 110 Benner Circle, Bellefonte, Pennsylvania 16823, United States

4. Department of Chemical Engineering, Brigham Young University, Provo, Utah 84602, United States

Funder

Restek Corp.

Publisher

American Chemical Society (ACS)

Subject

Analytical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.analchem.1c05029

Reference56 articles.

1. The Surface Chemistry of Atomic Layer Depositions of Solid Thin Films

2. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

3. Atomic Layer Epitaxy

4. Atomic Layer Deposition: An Overview

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