Improved uniformity of atomic-layer-deposited HfO2 film along the length of glass monocapillary with high length-diameter ratio-Reference-Cited by-同舟云学术

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Improved uniformity of atomic-layer-deposited HfO2 film along the length of glass monocapillary with high length-diameter ratio

Published:2024-06 Issue: Volume:152 Page:115440
ISSN:0925-3467
Container-title:Optical Materials
language:en
Short-container-title:Optical Materials

Author:

Li Yanli,Wu Hongchang,Lv Wensi,Kong Xiangdong,Han Li,Zhang He^ORCID

Publisher

Elsevier BV

Reference35 articles.

1. Detailed investigation of the surface mechanisms and their interplay with transport phenomena in alumina atomic layer deposition from TMA and water;Gakis;Chem. Eng. Sci.,2019

2. Numerical modeling of atomic layer deposition supercycles;Kunene;Mater. Today: Proc.,2022

3. Effect of various oxidants on reaction mechanisms self-limiting natures and structural characteristics of Al2O3 films grown by atomic layer deposition;Wang;Adv. Mater. Interfac.,2018

4. AxBAxB. . . pulsed atomic layer deposition: numerical growth model and experiments;Muneshwar;J. Appl. Phys.,2016

5. Atomic layer deposition process optimization by computational fluid dynamics;Deng;Vacuum,2016

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Performance characterization of an Al₂O₃/HfO₂ parabolic multilayer based on a laboratory X-ray source;Applied Optics;2024-07-31

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