Atomic Layer Deposition: Effect of Various Oxidants on Reaction Mechanisms, Self-Limiting Natures and Structural Characteristics of Al2 O3 Films Grown by Atomic Layer Deposition (Adv. Mater. Interfaces 14/2018)-Reference-Cited by-同舟云学术

Atomic Layer Deposition: Effect of Various Oxidants on Reaction Mechanisms, Self-Limiting Natures and Structural Characteristics of Al2 O3 Films Grown by Atomic Layer Deposition (Adv. Mater. Interfaces 14/2018)

Published:2018-07 Issue:14 Volume:5 Page:1870070
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Wang Haoran¹,Liu Yunfei¹,Liu Hui¹,Chen Zheng¹,Xiong Pengpeng¹,Xu Xiangchen¹,Chen Fangyi²,Li Kun¹,Duan Yu¹

Affiliation:

1. State Key Laboratory on Integrated Optoelectronics; College of Electronic Science and Engineering; Jilin University; Jilin 130012 China

2. College of Materials Science and Engineering; Jilin University; Jilin 130012 China

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/admi.201870070/fullpdf

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