Dynamic annealing in ion implanted SiC: Flux versus temperature dependence

Author:

Kuznetsov A. Yu.,Wong-Leung J.,Hallén A.,Jagadish C.,Svensson B. G.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 45 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Molecular dynamics study of Al implantation in 4H-SiC;2023 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD);2023-09-27

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3. Analysis of the electrical activation data in thermally annealed implanted Al/4H–SiC systems: A novel approach based on cooperativity;Materials Science in Semiconductor Processing;2022-09

4. A comparison study of mechanical change and chemical disorder in 4H-SiC irradiated with Si5+ and He2+ at room temperature;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2022-02

5. Status of 3 C ‐ SiC Growth and Device Technology;Wide Bandgap Semiconductors for Power Electronics;2021-10-29

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